| Day 1, May-26-2008 |
| Start |
Session |
Duration |
| 13:00 |
Registration
Distribution of badges, presentation papers etc. |
60min |
| 14:00 |
Opening Remarks to the 2nd IS-Test Workshop (ITWS)
Speaker: Peter Haigner / Jürgen Ockens / Torsten Liese
Organisational items regarding the workshop, agenda, time line, general
|
15min |
| 14:15 |
1st Session by IS-Test GmbH Munich
"Dirty Talk about Probe Card Cleaning"
Speaker: Torsten Liese
- Q & A related to this session
|
45min |
| 15:00 |
Coffee break |
15min |
| 15:15 |
2nd Session: International Test Solutions US & Europe
"Survey of Probe Card Cleaning Technologies and Practices for High Volume Wafer Sort"
Speaker: Gene Humphrey
- Q & A related to this session
|
45min |
| 16:00 |
Coffee break |
15min |
| 16:15 |
3rd Session. Beijert Engineering BV Netherlands
"Sanding and Cleaning on your Probe Card Analyzer?"
Speaker: Oscar Beijert
- Q & A related to this session
|
45min |
| 17:00 |
Coffee break |
15min |
| 17:15 |
4th Session: T.I.P.S. GmbH, Austria (Villach)
"Offline cleaning of epoxy, vertical and lithographic probe card technologies - life time impacts on the probe card, effects on Cres"
Speaker: Dr. Rainer Gaggl
- Q & A related to this session
|
45min |
| 18:30 |
Dinner |
open |
|
| Day 2, May-27-2008 |
| 09:15 |
5th Session: NXP Hamburg
"Wafer Probers & probe card cleaning process as part of the entire wafer test process"
Speaker: Thomas Dabelstein & Jan Martens
- Q & A related to this session
|
45min |
| 10:00 |
6th Session: Salland Engineering BV Netherlands
"Probe tip cleaning on demand (dynamic clean)"
Speaker: Rob Marcelis
- Q & A related to this session
|
45min |
| 10:45 |
Coffee break |
15min |
| 11:00 |
7th Session: International Test Solutions US & Europe
"Methodologies for Accessing Key On- Line Cleaning Process Parameters"
Speaker: Gene Humphrey
- Q & A related to this session
|
45min |
| 11:45 |
8th Session by IS- Test
"Summary of 2nd Workshop, theme proposal for 3rd ITWS"
Speaker: Peter Haigner / Jürgen Ockens / Torsten Liese
|
15min |
| 12:00 |
End of workshop |
|
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